Semiconductor devices and manufacturing methods thereof

ABSTRACT

Embodiments include semiconductor devices and methods of manufacture, one of which includes a capacitor unit formed on a silicon substrate. The capacitor unit is divided into a plurality of capacitor subunits which are partitioned from each other by a separating insulation layer. Each of the capacitor subunits includes a first electrode layer composed of an impurity diffusion layer formed in the silicon substrate, a second electrode layer composed of a conductive polysilicon layer and a dielectric layer composed of a silicon oxide layer interposed between the first electrode layer and the second electrode layer. The respective capacitor subunits are connected in parallel to each other through a connector.

TECHNICAL FIELD

The present invention relates to semiconductor devices including acapacitor unit having a large capacitance and methods of manufacturingsuch semiconductor devices.

BACKGROUND

Devices such as portable phones and the like, which are small in sizeand mainly used while being carried, have various requirements toachieve weight reduction and miniaturization. To reduce the number ofparts has been examined as a means for the requirements.

Capacitors having a large capacitance, which are used in voltageincreasing circuits in, for example, power supply circuits, forincreasing an external power supply voltage to a high voltage of about3-9 V, occupy a large space. Thus, they are sometimes arranged ascomponents different from IC chips, in which a driver circuit is formed,and packaged on boards or substrates. In such a case, since the numberof parts is increased, the requirements for the weight reduction andminiaturization are not satisfied and moreover a parts packaging processis made necessary, which is disadvantageous in assembling cost.

SUMMARY

One embodiment of the present invention relates to a semiconductordevice, including a capacitor unit formed on a semiconductor substrate.The capacitor unit is divided into a plurality of capacitor subunitswhich are separated from each other by a separating layer. Each of thecapacitor subunits includes a first electrode layer, a second electrodelayer, and a dielectric layer interposed between the first electrodelayer and the second electrode layer.

Another embodiment relates to a method of manufacturing a semiconductordevice, including forming a capacitor unit on a semiconductor substrate.The capacitor unit is divided into a plurality of capacitor subunits insuch a manner that first and second conductive layers are divided by aseparating layer having a predetermined pattern. Each of the capacitorsubunits comprises a first electrode layer, a second electrode layer,and a dielectric layer interposed between the first electrode layer andthe second electrode layer.

Another embodiment relates to a method for manufacturing a semiconductordevice including forming a plurality of capacitor subunits on asubstrate, the subunits each including a first electrode layer, adielectric layer, and a second electrode layer. A separating layer isformed between adjacent subunits, the separating layer including aninsulating layer disposed between adjacent second electrode layers. Atleast a plurality of the subunits are connected together in parallel. Atleast one MOS transistor is formed on the substrate, the MOS transistorincluding at least one layer formed at the same time using the samedeposition process as at least one layer of the plurality of capacitorsubunits.

Still another embodiment relates to semiconductor device including aplurality of capacitor subunits on a substrate, the subunits eachincluding a first electrode, a dielectric, and a second electrode. Aseparation layer is disposed between the subunits, the separation layerincluding a first interlayer insulating layer, a dielectric layer, and aprotective layer.

BRIEF DESCRIPTION OF THE DRAWINGS

Certain embodiments of the invention are described with reference to theaccompanying drawings which, for illustrative purposes, are schematicand not necessarily drawn to scale.

FIG. 1 is a plan view schematically showing a semiconductor device,which includes a MOS type capacitor unit, according to a firstembodiment of the present invention.

FIG. 2 is a plan view showing the region 1A shown in FIG. 1 in anenlarged fashion in which shown is a state that capacitor subunits areconnected to each other.

FIG. 3 is a sectional view taken along the line B—B shown in FIG. 2.

FIG. 4 is a plan view schematically showing a semiconductor device,which includes a MIM type capacitor unit, according to a secondembodiment of the present invention.

FIG. 5 is a sectional view taken along the line C—C shown in FIG. 4.

FIG. 6 is a sectional view schematically showing an embodiment of amethod of manufacturing a semiconductor device such as the secondembodiment of the present invention.

FIG. 7 shows a step in a method of manufacturing a semiconductor deviceafter the step of FIG. 6.

FIG. 8 shows a step in a method of manufacturing a semiconductor deviceafter the step of FIG. 7.

FIG. 9 shows a step in a method of manufacturing a semiconductor deviceafter the step of FIG. 8.

FIG. 10 shows a step in a method of manufacturing a semiconductor deviceafter the step of FIG. 9.

FIG. 11 shows a step in a method of manufacturing a semiconductor deviceafter the step of FIG. 10.

FIG. 12 shows a step in a method of manufacturing a semiconductor deviceafter the step of FIG. 11.

FIG. 13 shows a step in a method of manufacturing a semiconductor deviceafter the step of FIG. 12.

FIG. 14 shows a step in a method of manufacturing a semiconductor deviceafter the step of FIG. 13.

FIG. 15 shows a step in a method of manufacturing a semiconductor deviceafter the step of FIG. 14.

FIG. 16 shows a step in a method of manufacturing a semiconductor deviceafter the step of FIG. 15.

FIG. 17 shows a step in a method of manufacturing a semiconductor deviceafter the step of FIG. 16.

FIG. 18 shows a step in a method of manufacturing a semiconductor deviceafter the step of FIG. 17.

FIG. 19 shows a step in a method of manufacturing a semiconductor deviceafter the step of FIG. 18.

FIG. 20 shows a step in a method of manufacturing a semiconductor deviceafter the step of FIG. 19.

FIG. 21 is a view showing a result of a test executed to examine thecapacitance of the semiconductor device according to the firstembodiment of the present invention.

FIG. 22 is a view showing a result of a test executed to examine therelationship between the capacitance and the frequency of thesemiconductor device according to the first embodiment of the presentinvention.

FIG. 23 is a view showing a result of a test executed to examine therelationship between the field intensity and the time, when 0.1% offraction defective is caused, of the semiconductor device according tothe first embodiment of the present invention.

DETAILED DESCRIPTION

Certain embodiments of the present invention relate to a semiconductordevice, which is preferably applied to a capacitor and, in particular,to a capacitor having a large capacitance and a large occupying area,and a method of manufacturing the capacitor.

A semiconductor device according to one preferred embodiment of thepresent invention includes a capacitor unit formed on a semiconductorsubstrate, wherein the capacitor unit is divided into a plurality ofcapacitor subunits which are separated from each other by a separatinglayer, and each of the capacitor subunits includes a first electrodelayer, a second electrode layer, and a dielectric layer interposedbetween the first electrode layer and the second electrode layer.

In the above-described semiconductor device, the capacitor unit isdivided into a plurality of capacitor subunits having a predeterminedpattern by a separating layer. The separating layer is preferablycomposed of a plurality of silicon oxide layers formed on thesemiconductor substrate. Since the separating layer is, generally, asolid layer composed of a silicon oxide layer, the mechanical strengthof the capacitor unit can be increased by the separating layer, andaccordingly the external force acting on the capacitor subunits can beeased.

Since the mechanical strength of the capacitor unit can be increased bythe separating layer, the semiconductor device according to certainembodiments of the present invention is particularly effective for asemiconductor device in which a pair of chips are packaged such as, forexample, COB (chip on board), COG (chip on glass), COF (chip on film),TCP (tape carrier package), TAB (tape automated bonding), and the like.That is, in these packaging methods, pressure acts on them because theyare jointed to a board or a substrate by crimping. Thus, the elements inthe semiconductor chips are subjected to stress. This problem may bemore of a concern when an element has a larger area. However, accordingto certain preferred embodiments of the present invention, since thestress applied to the capacitor subunits is eased by the separatinglayer, even if the capacitor unit has a large area, it can be reliablyprevented that the capacitor subunits are broken by the stress.

The following aspects may be employed as the capacitor unit which isincluded in certain preferred embodiments of the present invention.

In a first aspect of certain embodiments, each of the capacitor subunitsmay include a first electrode layer composed of an impurity diffusionlayer formed on the semiconductor substrate, a dielectric layer composedof, for example, a silicon oxide layer formed on the first electrodelayer, and a second electrode layer composed of a conductive siliconlayer formed on the dielectric layer.

A semiconductor device including capacitor subunits according to certainembodiments of the present invention can be easily manufactured becauseit can be manufactured by modifying a known process for forming asemiconductor device including a MOS transistor.

A dielectric layer may be composed of a silicon oxide layer formed usinga process also used to form the gate insulating layer of a MOStransistor, and the second electrode layer may be composed of aconductive silicon layer formed using a process also used to form thegate electrode of the MOS transistor. Further, it is preferable that theseparating layer for partitioning the capacitor subunits includes atleast a silicon oxide layer formed by the same process as that of anelement separating region. In a preferred semiconductor device, sincethe dielectric layer is composed of a thermal oxide layer similar to thegate insulating layer of the MOS transistor, it is thin in thickness andminute, and accordingly the capacitor unit has a large capacitance andhas high reliability.

Further, in a preferred semiconductor device, it is preferable that atleast one shading layer is further formed above the second electrodelayer. The shading layer may be composed of a metal layer formed by thesame process as that of the metal wiring layer of the semiconductorsubstrate including the MOS transistor. In the above structure, externallight is reflected by the shading layer and does not almost reach theinterior of the semiconductor device. Accordingly, it is difficult forthe capacitor unit to be affected by the light in a PN junction andstable operation can be carried out for a long time.

In a second aspect of certain preferred embodiments, each of thecapacitor subunits includes a first electrode layer composed of a metallayer formed above the semiconductor substrate, a dielectric layerformed on the first electrode layer, and a second electrode layercomposed of a metal layer formed on the dielectric layer.

The semiconductor device including the capacitor subunits of certainembodiments can be easily manufactured because it can be manufactured bymodifying a known process for forming semiconductor devices including aMOS transistor, similar to that described above.

The first electrode layer constituting each of the capacitor subunitsmay be composed of a metal layer which is manufactured by a process alsoused to form the first metal wiring layer of a semiconductor deviceincluding a MOS transistor. Further, the second electrode layerconstituting each of the capacitor subunits may be composed of a metallayer which is manufactured by a process also used to form the secondmetal wiring layer of the semiconductor device including the MOStransistor.

A separating layer for partitioning the capacitor subunits includes atleast an interlayer insulating layer interposed between the firstelectrode layer and the second electrode layer.

It is preferable that the dielectric layer is disposed along the surfaceof the opening formed in the interlayer insulating layer on the firstelectrode layer, and the opening is formed such that the side thereof ismade to a taper shape with the diameter thereof being graduallyincreased toward the second electrode layer. According to the structure,since the taper is provided with the opening of the interlayerinsulating layer interposed between the first electrode layer and thesecond electrode layer, the deterioration of step coverage can besuppressed when the dielectric layer is formed in the opening.Therefore, a short circuit between the second electrode layer and thefirst electrode layer in the opening of the interlayer insulating layercan be reliably prevented.

The semiconductor device of certain preferred embodiments of the presentinvention may include such a structure that the above capacitor unit andother circuit elements including at least the MOS transistor are mountedon the same semiconductor substrate. Since the capacitor unit can beformed by a process common to that of the semiconductor device includingthe MOS transistor, the capacitor unit may be formed on the same siliconsubstrate as that of other semiconductor circuit region such as a logiccircuit and the like. When the capacitor unit and the othersemiconductor circuit region are mounted on the same substrate asdescribed above, the semiconductor device of preferred embodiments ofthe present invention is advantageous in a reduced packaging cost, areduced occupying area and the like.

A preferred method of manufacturing a semiconductor device of thepresent invention includes the step of forming a capacitor unit on asemiconductor substrate, wherein the capacitor unit is divided into aplurality of capacitor subunits in such a manner that first and secondconductive layers are divided by a separating layer having apredetermined pattern and each of the capacitor subunits includes afirst electrode layer, a second electrode layer, and a dielectric layerinterposed between the first electrode layer and the second electrodelayer.

The preferred method of manufacturing the semiconductor device of thefirst aspect including the capacitor subunits includes the step offorming the first electrode layer by forming an impurity diffusion layerin a predetermined pattern on the semiconductor substrate, the step offorming a dielectric layer by forming, for example, a silicon oxidelayer on the first electrode layer, and the step of forming a secondelectrode layer by forming a conductive silicon layer in a predeterminedpattern on the dielectric layer.

Further, a preferred method of manufacturing the semiconductor device ofthe second aspect including the capacitor subunits includes the step offorming a first electrode layer by forming a metal layer in apredetermined pattern above the semiconductor substrate, the step offorming a dielectric layer on the first electrode layer, and the step offorming a second electrode layer by forming a metal layer in apredetermined pattern on the dielectric layer.

Certain preferred embodiments of the present invention will be describedbelow in detail with reference to the drawings.

FIG. 1 is a plan view schematically showing the main portion of asemiconductor device according to a first embodiment. FIG. 2 is a planview showing the region denoted by numeral 1A in FIG. 1 in an enlargedfashion. FIG. 3 is a sectional view showing the portion taken along theline B—B in FIG. 2.

A capacitor unit 100 which is included in a semiconductor deviceaccording to the first embodiment is divided into a plurality ofcapacitor subunits 21 as shown in FIG. 1. The respective capacitorsubunits 21 are partitioned by a separating layer (hereinafter, it isreferred to as a separating insulation layer) 20 preferably composed ofan insulating layer. In the example illustrated in FIG. 1, theseparating insulation layer 20 is formed in a grid shape and eachcapacitor subunit 21 is formed in each grid of the separating insulationlayer 20. The capacitor subunit 21 is formed such that the plane shapethereof is preferably made to an approximately square shape. As shown inFIG. 2 in the enlarged fashion, it is preferred that the respectivecapacitor subunits 21 are connected to each other in parallel through aconnection 41.

As shown in FIGS. 2 and 3, each of the capacitor subunits 21 includes acapacitor which is composed of a first electrode layer 14, a secondelectrode layer 19 and a dielectric layer 18 interposed between thefirst electrode layer 14 and the second electrode layer 19. In FIG. 2,the layers located on and above an interlayer insulating layer 220 shownin FIG. 3 are not shown.

The first electrode layer 14 is composed of, for example, an N-type highconcentration impurity diffusion layer formed in the N-type well 12 in aP-type silicon substrate 10. The dielectric layer 18 is preferablycomposed of a silicon oxide layer formed on the first electrode layer 14which is composed of the impurity diffusion layer. Then, the secondelectrode layer 19 is preferably composed of a conductive polysiliconlayer formed on the dielectric layer 18.

The cross-sectional structure of the capacitor unit 100 will bedescribed below with reference to FIG. 3.

The capacitor unit 100 is further composed of a first interlayerinsulating layer 220, a first shading layer 230, a second interlayerinsulating layer 260 and a second shading layer 310 which are formed onthe second electrode layer 19 in this sequence. Then, a protective layer(passivation layer) 34 is formed as the uppermost layer of the capacitorunit 100. The plane shapes of the first and second shading layers 230and 310 are formed substantially similarly to that of the secondelectrode layer 19.

Accordingly, the integrated separating insulation layer 20, whichextends in the film thickness direction of the silicon substrate 10, isformed by an insulating layer which constitutes a LOCOS layer 16, thefirst interlayer insulating layer 220, the second interlayer insulatinglayer 260 and the protective layer 34 between the respective capacitorsubunits 21. That is, adjacent capacitor subunits 21 are partitioned bya separating insulation layer 20 including the silicon oxide layer. Morespecifically, adjacent capacitor subunits 21 and 21 are separated fromeach other by a section 20 a which is composed of a portion 16 a of theLOCOS layer 16 continuous to the dielectric layer 18, a portion 220 a ofthe first interlayer insulating layer 220 formed so as to cover thesecond electrode layer 19, a portion 260 a of the second interlayerinsulating layer 260 formed so as to cover the first shading layer 230and a portion 34 a of the protective layer 34 formed so as to cover thesecond shading layer 310.

Further, as shown in FIG. 2, the respective capacitor subunits 21 areconnected to each other in parallel through the connection 41. That is,the first electrode layers 14 each composed of the impurity diffusionlayer are connected to each other through a first connecting section 41a, and the second electrode layers 19 each composed of the conductivesilicon layer are connected to each other through a second connectingsection 41 b. The first connecting section 41 a is preferably composedof an impurity diffusion layer contiguous to the first electrode layer(impurity diffusion layer) 14, and the second connecting section 41 b ispreferably composed of a polysilicon layer contiguous to the secondelectrode layer (polysilicon layer).

Further, it is preferable in the first embodiment that at least oneshading layer (two layers in the embodiment) is formed on and above thesecond electrode layer 19 as shown in FIG. 3. The shading layers 230 and310 have a function for reflecting light which varies a capacitance inthe PN junction in the silicon substrate 10 (for example, in thejunction of the P-type silicon substrate 10 and the N-type well 12 inFIG. 3). That is, when light is irradiated to the PN junction, a leakagecurrent may be generated by the occurrence of a carrier. In theembodiment, however, the occurrence of the leakage current can beprevented by the provision of the shading layers 230 and 310. A metallayer of aluminum alloy (for example, Al—Si—Cu, Al—Cu) or the like whichconstitutes a metal wiring layer may be used as the shading layers 230and 310.

The capacitor unit 100 according to the first embodiment can be made onthe same substrate as that of electronic elements such as a MOStransistor and the like using a process that is also used to form asemiconductor device including the MOS transistor.

The impurity diffusion layer constituting the first electrode layer 14can be formed by introducing impurities into the well 12 by a knowmethod using ion implantation. The silicon oxide layer constituting thedielectric layer 18 can be formed by a process also used to form thegate insulating layer of the MOS transistor. Accordingly, the dielectriclayer 18 can constitute a thin layer which preferably has a filmthickness of about 10 to about 100 nm, whereby the capacitance of thecapacitor subunits 21 can be increased. Further, the second electrodelayer 19 can be formed by a process also used to form the gate electrodeof the MOS transistor. The shading layers 230 and 310 can be formed by aprocess also used to form the first and second metal wiring layers forthe semiconductor device including the MOS transistor. Similarly, theLOCOS layer 16, the interlayer insulating layer 220 and 260 and theprotective layer (passivation layer) 34 can be also formed using aprocess also used to form various layers in semiconductor deviceelements such as the MOS transistor and the like.

The materials of the respective layers constituting the capacitor unit100 can be changed in accordance with the processes used to manufacturethe other electronic elements such as the MOS transistor and the like.For example, an STI (shallow trench isolation) structure having aninsulating layer buried in a trench can be used in place of the LOCOSlayer 16, and a conductive layer of another material such as steel orthe like can be used in place of the aluminum alloy layer. Further, theconductive type of the impurity diffusion layer constituting the firstelectrode layer 14 may be a P-type. In addition, the dielectric layer 18is not limited to the silicon oxide layer and may be a dielectric layerof a silicon nitride layer, a tantalum oxide layer or the like.

The first embodiment has the following operation and effect. Thecapacitor unit 100 is divided into a plurality of capacitor subunits 21having a predetermined pattern by the continuous separating insulationlayer 20. Then, the separating insulation layer 20 is composed of theplurality of silicon oxide layers formed in the film thickness directionof the silicon substrate 10, specifically, of the LOCOS layer 16, thefirst interlayer insulating layer 220, the second interlayer insulatinglayer 260, and the protective layer 34. Therefore, as shown in FIG. 1,the respective capacitor subunits 21 have such a structure that theperipheries thereof are surrounded by the separating insulation layer 20composed of the continuous silicon oxide layer. Then, since theseparating insulation layer 20 is, preferably, a solid layer composed ofthe silicon oxide layer, the mechanical strength of the capacitor unit100 can be increased by the separating insulation layer 20. Therefore,the external force acting on the capacitor subunits 21 can be eased.

Since the mechanical strength of the capacitor unit 100 can be increasedby the separating insulation layer 20 as described above, thesemiconductor device according to certain embodiments is particularlyeffective when it is packaged as a pair of chips such as, for example,COB, COG, COF, TCP, TAB and the like. That is, in the packaging methodof them, pressure acts on semiconductor chips and the elements in thesemiconductor chips are subjected to stress because they are joined to aboard or a substrate by crimping. The stress may cause a problem such asdistortion and the like on a metal layer of, in particular, aluminumalloy and the like. This problem may be more apparent when an elementhas a larger area.

However, according to the semiconductor device of the first embodiment,since the stress applied to the capacitor subunits 21 is eased by theseparating insulation layer 20, even if the capacitor unit 100 has alarge area, breakage of the capacitor subunits 21 due to the stress canbe inhibited.

In the first embodiment, since the first and second shading layers 230and 310 reflect light, the capacitor unit 100 is unlikely to be affectedby the light even if it has a PN junction, whereby stable operation canbe carried out by the capacitor unit 100 for a long time.

That is, when a capacitor has a PN junction, a carrier is liable to becaused by the light incident on the PN junction and the capacitance ofthe capacitor is liable to be made unstable. However, the above problemis not caused in the first embodiment because the capacitor unit 100 hasthe shading layers 230 and 310, each of which is preferably composed ofthe metal layer on and above the second electrode layer 19 and externallight is reflected thereby and is thus inhibited from reaching theinside of the silicon substrate 10.

In the semiconductor device of the embodiment, since the dielectriclayer 18 constituting each capacitor subunit 21 is formed by the thermaloxide layer similar to the gate insulating layer of a MOS transistor, itis thin in a film thickness. Therefore, the capacitor unit 100 has alarge capacitance and is highly reliable.

In the semiconductor device of the first embodiment, since the capacitorunit 100 can be formed by a process which is also used to form a MOStransistor, the capacitor unit 100 can be formed on a silicon substratesimilar to that of other semiconductor devices such as a logic circuitand the like. When the capacitor unit 100 and the other semiconductordevices are mounted on the same substrate, the semiconductor device ofthe embodiment is advantageous in a packaging cost, a reduced occupyingarea and the like.

Further, since the semiconductor device of the embodiment bemanufactured using a process also used to form the other semiconductordevices such as the logic circuit and the like, it can be easilymanufactured.

Furthermore, since the capacitor subunits 21 may be connected inparallel to each other through the connector 41, their capacitance canbe increased.

Next, the representative results of the characteristics test of thesemiconductor device according to the first embodiment will bedescribed. Used as test samples were semiconductor devices each of whichwas arranged such that a first electrode layer 14 was composed of anN-type impurity diffusion layer formed by implanting phosphorous ions inan amount of 1.3×10¹³/cm² with implantation energy of 100 keV, adielectric layer 18 was a silicon oxide layer formed by thermaloxidation and a second electrode layer 19 was composed of a conductivepolysilicon layer having a film thickness of about 400 nm.

The basic characteristics generally required for the capacitor unit(capacitor) include a capacitance, withstand pressure, reliability andthe like.

Three types of samples of the capacitor units each having a dielectriclayer composed of a silicon oxide layer having a different area weremade, a high frequency was imposed on the electrodes of the capacitorunits, impedance was measured and capacitances were determined from theresult of the measurement. The result of measurement is shown in FIG.21. FIG. 21 shows the relationship between the area of the dielectriclayer and the capacitance. In FIG. 21, the line shown by a symbol ashows the result of the samples in which the dielectric layer has a filmthickness of 18 nm and the line shown by a symbol b shows the result ofthe samples in which the dielectric layer has a film thickness of 30 nm.

It is confirmed from FIG. 21 that in the samples of the embodiment, thecapacitance is increased in proportion to the area of the dielectriclayer.

The capacitances of samples were determined at a plurality oftemperature conditions (25° C., 40° C., and 80° C.). As a result, it isfound that a degree of change of capacitance is different between adepletion state (a state in which the voltage of the first electrodelayer was 0 V and the voltage of the second electrode layer wasnegative) and an accumulated state (a state in which the voltage of thefirst electrode layer was 0 V and the voltage of the second electrodelayer was positive). That is, in the depletion state at the maximum atthe temperatures of 25° C. and 80° C., a difference of capacitance ofabout 20% is found when the film thickness of the dielectric layer is 18nm, and a difference of capacitance of about 10% is found at the maximumwhen the film thickness thereof is 30 nm. In contrast, in theaccumulated state at the temperature of 25° and 30°, a difference ofcapacitance is about 0.1% even if the film thickness of the dielectriclayer is any of 18 nm and 30 nm, whereby it can be confirmed that thereis substantial temperature dependence in this state.

The capacitances of samples were determined under a plurality offrequency conditions. The dielectric layer of the samples used in thetest had a film thickness of 18 nm. As a result, it is confirmed thatthere is substantially no frequency dependency in the accumulated state.This is shown in FIG. 22. In FIG. 22, the abscissa shows frequency andthe ordinate shows capacitance. It can be confirmed from FIG. 22 that,in the samples of the embodiment, the capacitance is nearly unchanged inthe range of about 20 Hz-about 100 kHz and is constant regardless offrequency.

TDDB (time dependent dielectric breakdown) does not mean the initialfailure of a dielectric layer but means dielectric breakdown which iscaused after a certain period of time passes in a state that a voltageis imposed on the dielectric layer. The life of the dielectric layerwhen it is used in a certain state can be estimated by the test. In thetest, the time (TTF: time to failure) when failure of 0.1% was caused inthe dielectric layer was determined by imposing a plurality of voltagesthereon in the accumulated state. This is shown in FIG. 23. In theexample of the experiment, the film thickness of the dielectric layerwas set to about 18 nm and a measuring temperature was set to 70°. InFIG. 23, the abscissa shows stress electric field and the ordinate showstime (TTF) when failure of 0.1% is caused. It is confirmed from FIG. 23that, in the semiconductor device of the embodiment, when a fieldintensity being used is set to, for example, 3.3 MV/cm, the fractiondefective of the dielectric layer is less than 0.1% for at least 10years.

As described above, it is confirmed from these tests that, according tothe semiconductor device of the embodiment, a sufficient capacitance canbe obtained and moreover good results can be obtained in the variouscharacteristics such as the temperature dependency, frequencydependency, TDDB and the like.

FIG. 4 is a plan view schematically showing the main portion of asemiconductor device according to a second embodiment in an enlargedfashion, and FIG. 5 is a sectional view of a portion taken along theline C—C in FIG. 4. FIG. 4 for the second embodiment corresponds to theview of FIG. 2 of the first embodiment.

A capacitor unit 200, which is included in the semiconductor deviceaccording to the embodiment, is divided into a plurality of capacitorsubunits 21 as shown in FIG. 1, similar to the first embodiment. Therespective capacitor subunits 21 are partitioned by a separating layer(hereinafter, referred to as a separating insulation layer) 20 composedof an insulating layer. In the example, the separating insulation layer20 is formed in a grid shape and each capacitor subunit 21 is formed ineach grid of the separating insulation layer 20. The capacitor subunit21 is formed such that the plane shape thereof is made to a squareshape. As shown in FIG. 4, the respective capacitor subunits 21 areconnected to each other in parallel through a connector 41.

As shown in FIGS. 4 and 5, the capacitor subunit 21 includes a capacitorwhich is composed of a first electrode layer 25, a second electrodelayer 31 and a dielectric layer 27 interposed between the firstelectrode layer 25 and the second electrode layer 31. The protectivelayer (passivation layer) 34 shown in FIG. 5 is not shown in FIG. 4.

The first electrode layer 25 is composed of a conductive layer formed ona first interlayer insulating layer 22 composed of a silicon oxidelayer. The dielectric layer 27 is composed of a silicon oxide layerformed on the first electrode layer 25. Then, the second electrode layer31 is composed of a metal layer formed on the dielectric layer 27. Thefirst electrode layer 25 is preferably composed of a metal layer 23,which preferably comprises a titanium layer, a titanium nitride layer,aluminum alloy or the like, and a titanium nitride layer 24. Thetitanium layer and the titanium nitride layer act as a barrier forpreventing the movement of a material from a material from theinterlayer insulating layer 22 to the metal layer 23 so that a spikephenomenon can be prevented. Further, the titanium nitride layer 24 onthe metal layer 23 acts as a reflection preventing film in aphotolithography process. The above layer structure can be also employedin the shading layers 230 and 310 of the first embodiment.

The cross-sectional structure of the capacitor unit 200 will bedescribed below with reference to FIG. 5.

The capacitor unit 200 is arranged such that the first electrode layer25, a second interlayer insulating layer 26, the dielectric layer 27,the second electrode layer 31 and the protective layer 34 are formed onthe first interlayer insulating layer 22.

The integrated separating insulation layer 20, which extends in the filmthickness direction of a silicon substrate, is formed between thecapacitor subunits 21 by an insulating layer which constitutes at leastthe second interlayer insulating layer 26 and the protective layer 34.That is, adjacent capacitor subunits 21 are partitioned by theseparating insulation layer 20 composed of the silicon oxide layer. Morespecifically, adjacent capacitor subunits 21 and 21 are separated fromeach other by a section 20 a which is composed of a portion 26 a of thesecond interlayer insulating layer 26 under the dielectric layer 27, aportion 27 a of the dielectric layer 27, a portion 34 a of theprotective layer 34 formed so as to cover the second electrode layer 31.

Further, as shown in FIG. 4, the respective capacitor subunits 21 areconnected to each other in parallel through the connection 41. That is,the first electrode layers 25 are connected to each other through afirst connecting section 41 a, and the second electrode layers 31 areconnected to each other through a second connecting section 41 b. Thefirst connecting section 41 a is composed of a conductive layercontinuous to the first electrode layer 25, and the second connectingsection 41 b is composed of a conductive layer continuous to the secondelectrode layer 31.

An opening located on the first electrode layer 25 is formed in thesecond interlayer insulating layer 26. The opening is formed by etchingthe second interlayer insulating layer 26, and a method of forming itwill be described later. The inner wall of the opening is preferably notvertical to the upper surface of the first electrode layer 25 but it istapered so that the diameter thereof is gradually increased upward. Thedielectric layer 27 having a thickness of about 10 nm to about 100 nm isformed in the opening and on the interlayer insulating layer 26. Thedielectric layer 27 is specifically a silicon oxide layer or an ONOlayer (layer made by forming an oxide layer, a nitride layer and anoxide layer) or the like.

The capacitor unit 200 according to the embodiment can be made on thesame substrate as that of electronic elements such as a MOS transistorand the like using a process also used to manufacture a semiconductordevice including the MOS transistor, similar to the first embodiment.That is, the conductive layers constituting the first electrode layer 25and the second electrode layer 31 can be manufactured using a processalso used to form the metal wiring layer of the semiconductor deviceincluding the MOS transistor. The first and second electrode layers maybe any two metal wiring layers which are adjacent to each other up anddown, and it is preferably composed of an uppermost metal wiring layerand a metal wiring layer under it. Similarly, the interlayer insulatinglayers 22 and 26 and the protective layer (passivation layer) 34 can beformed using a process also used for manufacturing the elements such asthe MOS transistor and the like in the same way.

The materials of the respective layers constituting the capacitor unit200 can be changed in accordance with the processes for manufacturingthe other electronic elements such as the MOS transistor and the like.For example, a metal layer of other metal such as steel or the like canbe used in place of the aluminum alloy layer.

FIG. 6-FIG. 20 are sectional views schematically showing a thirdembodiment, which is a method of manufacturing a semiconductor devicesuch as the second embodiment described above.

First, a titanium layer having a thickness of about 5 nm to about 50 nmis formed on an interlayer insulating layer 22, and a titanium nitridelayer having a thickness of about 10 nm to about 200 nm is formed on thetitanium layer. Thereafter, a conductive layer, which has a thickness ofabout 100 nm to about 1000 nm and is mainly composed of aluminum, forexample, an Al—Cu alloy layer or an Al—Si—Cu alloy layer 23, is formedon the titanium nitride layer by sputtering. Next, after a titaniumnitride layer 24 having a thickness of about 10 nm to about 100 nm isformed on the conductive layer 23, a first electrode layer 25 is formedon the interlayer insulating layer 22 by patterning the titanium nitridelayer 24, the conductive layer 23, the titanium nitride layer and thetitanium layer. Next, an interlayer insulating layer 26 having athickness of about 100 nm to about 1000 nm and composed of a siliconoxide layer such as a TEOS layer or the like is formed on the firstelectrode layer 25 and the interlayer insulating layer 22 by a CVDmethod as illustrated in FIG. 6.

Thereafter, as shown in FIG. 7, an i-line resist layer 35 is formed onthe interlayer insulating layer 26, and an opening 35 a located abovethe first electrode layer 25 is formed by exposing and developing thei-line resist layer 35.

Next, as shown in FIG. 8, an opening 26 b located above the firstelectrode layer 25 is formed in the interlayer insulating layer 26 bywet etching the interlayer insulating layer 26 while using the i-lineresist layer 35 as a mask. It is preferable to use an etching solutionhaving the following composition ratio in the above etching:

 (HF of 50%): (NH₄F of 40%): CH₃COH=2:20:10

When the interlayer insulating layer 26 is etched with the above etchingsolution using the above i-line resist layer 35 as the mask, a taper isformed on the etched surface thereof (inner wall of the opening 26 b).Since the i-line resist layer 35 has an excellent intimate contactproperty with the interlayer insulating layer (SiO₂ layer) 26, the taperformed on the opening 26 b has a proper angle. Specifically, the anglebetween the upper surface of the first electrode layer 25 and the innersurface of the opening 26 b is preferably set to about 30° to about 60°,as illustrated in FIG. 8.

Thereafter, as shown in FIG. 9, a dielectric layer 27 having a thicknessof about 80 nm to about 120 nm and composed of SiO₂ is formed in theopening 26 b and on the interlayer insulating layer 26 by a method suchas CVD.

Next, as shown in FIG. 10, a resist layer 37 is applied onto thedielectric layer 27, exposed and developed, whereby an opening 37 alocated above the first electrode layer 25 is formed in the resist layer37.

Thereafter, as shown in FIG. 11, an opening 27 a located above the firstelectrode layer 25 is formed by etching the dielectric layer 27 and theinterlayer insulating layer 26 using the resist layer 37 as a mask.Next, the resist layer 37 is removed by etching.

Next, as shown in FIG. 12, a conductive layer 30 having a thickness ofabout 100 nm to about 1000 nm and preferably composed of an Al—Si—Cualloy layer or an Al—Cu alloy layer is deposited in the opening 27 a andon the dielectric layer 27 by sputtering.

Thereafter, as shown in FIG. 13, a resist layer 39 is formed on theconductive layer 30, exposed and developed.

Next, as shown in FIG. 14, a second electrode layer 31 is formed on thefirst electrode layer 25 through the dielectric layer 27 by etching theconductive layer 30 using the resist layer 39 as a mask, and further anoutgoing electrode 32 electrically connected to the first electrodelayer 25 is formed.

Thereafter, as shown in FIG. 15, a silicon oxide layer 45 may bedeposited on the upper surface of a wafer including the second electrodelayer 31 and the outgoing electrode 32 by CVD. Next, as shown in FIG.16, a resist layer 47 is applied onto the silicon oxide layer 45,exposed and developed.

Thereafter, as shown in FIG. 17, the silicon oxide layer 45 is etchedusing the resist layer 47 as a mask, whereby an opening 45 a, which islocated on the second electrode layer 31, and an opening 45 b, which islocated on the outgoing electrode 32, are formed in the silicon oxidelayer 45. Next, the resist layer 47 is removed by etching.

Next, as shown in FIG. 18, it is preferred that a silicon nitride layer49 is deposited in the openings 45 a and 45 b and on the silicon oxidelayer 45 by the CVD method. Next, as shown in FIG. 19, a resist layer 51is applied onto the silicon nitride layer 49, exposed and developed.

Thereafter, as shown in FIG. 20, the silicon nitride layer 49 is etchedusing the resist layer 51 as a mask, whereby an outgoing opening 49 afor the second electrode layer 31 is formed in the silicon nitride layer49 at a position including the opening 45 a formed on the secondelectrode layer 31 and an outgoing opening 49 b for the first electrodelayer 25 is also formed in the silicon nitride layer 49 at a positionincluding the opening 45 b formed on the outgoing electrode 32. Next,the resist layer 51 is removed by etching.

In the embodiment, the opening 26 b is preferably formed by wet etchingthe interlayer insulating layer 26 using the i-line resist layer 35 asthe mask. However, it is also possible to form the opening 26 b bysubjecting the interlayer insulating layer 26 to dry etching having alarge selection ratio after it is wet etched using the i-line resistlayer 35 as the mask, in place of the above method. Further, it is alsopossible to form the opening 26 b by subjecting the interlayerinsulating layer 26 to the dry etching having the large selection ratiousing the resist layer as a mask.

The second embodiment has the following operation and effect. Thecapacitor unit 200 is divided into the plurality of capacitor subunits21 having the predetermined pattern by the continuous separatinginsulation layer 20, similar to the first embodiment. Then, theseparating insulation layer 20 is composed of the plurality of siliconoxide layers formed in the film thickness direction of the siliconsubstrate. Specifically, the separating insulation layer 20 is composedof the second interlayer insulating layer 26, the dielectric layer 27and the protective layer 34. Therefore, as shown in FIG. 1, therespective capacitor subunits 21 have such a structure that theperipheries thereof are surrounded by the separating insulation layer 20comprising the continuous silicon oxide layer. Since the separatinginsulation layer 20 is, generally, a solid layer composed of the siliconoxide layer, the mechanical strength of the capacitor unit 200 can beincreased by the separating insulation layer 20, and the external forceacting on the capacitor subunits 21 can be eased.

Since the mechanical strength of the capacitor unit 200 can be increasedby the presence of the separating insulation layer 20, the semiconductordevice according to the second embodiment is particularly effective whenit is packaged as a pair of chips such as, for example, COB, COG, COF,TCB, TAB and the like. That is, in the packaging method of semiconductorchips, pressure acts on them because they are joined to a board or asubstrate by crimping. Thus, the elements in the semiconductor chips aresubjected to stress. The stress is liable to cause a problem such asdistortion and the like in metal layers (first and second electrodelayers 25 and 31) of, in particular, aluminum alloy and the like. Then,this problem is generally more significant when an element has a largerarea.

However, according to the semiconductor device of the second embodiment,since the stress applied to the capacitor subunits 21 is eased by theseparating insulation layer 20, the capacitor subunits 21 can bereliably prevented from being broken by the stress even if the capacitorunit 200 has a large area.

According to the semiconductor device of the second embodiment, sincethe taper is provided with the opening of the interlayer insulatinglayer 26 interposed between the first electrode layer 25 and the secondelectrode layer 31, the deterioration of step coverage can be suppressedwhen the dielectric layer 27 is formed in the opening. Therefore, ashort circuit between the second electrode layer 31 and the firstelectrode layer 25 in the opening of the interlayer insulating layer 26can be reliably inhibited.

Further, in the second embodiment, when the opening 26 b is formed inthe interlayer insulating layer 26, the titanium nitride layer 24preferably remains without being etched. Accordingly, the surface of thefirst electrode layer 25 can be made flat with less irregularities,whereby the defects such as pinholes and the like can be reduced on thesurface of the first electrode layer and the film quality of thedielectric layer 27 can be improved. As a result, the capacitor unithaving high reliability can be formed.

In a case when the titanium nitride layer 24 is also removed by etchingin the formation of the opening 26 b, the irregularities, whichoriginally exist on the surface of the aluminum alloy layer 23 formed bysputtering, are made more notable. The irregularities affect the filmquality of the dielectric layer, increase the number of defects of thedielectric layer and cause the variation of the film thickness of thedielectric layer. As a result, problems are liable to be caused in thata yield is reduced and reliability is lowered in the manufacture of asemiconductor device. In the second embodiment, however, these problemscan be solved by the provision of the above structure. Further, thestructure not only can reduce the defects discovered in a short periodof time but also can reduce the defects which arise over a long periodof time (defects discovered in a reliability test).

In the semiconductor device of the second embodiment, since thecapacitor unit 200 may be formed by modifying a known process used forforming a MOS transistor to form the layers of the capacitor unit 200 atthe same time as layers of the MOS transistor, similar to the firstembodiment, the capacitor unit 200 can be formed on a silicon substratesimilar to that of other semiconductor devices such as a logic circuitand the like. When the capacitor unit 200 and other semiconductordevices are mounted on the same substrate, the semiconductor device ofthe embodiment is advantageous in a packaging cost, a reduced occupyingarea and the like.

Further, since the semiconductor device of the second embodiment can bemanufactured using a process also used to form other semiconductordevices such as the logic circuit and the like, it can be easilymanufactured.

While the preferable embodiments of the present invention have beendescribed above, the present invention is by no means limited theretoand various aspects can be employed within the gist of the presentinvention.

For example, while the separating insulation layer may have thecontinuous grid-shaped plane pattern described above, the presentinvention is not limited thereto, and the separating insulation layermay have another plane pattern, for example, a plane pattern by whichthe plane pattern of the capacitor subunits is made to a shape otherthan a square shape, such as, for example, a rectangular shape or ahexagonal shape.

Further, while the separating insulation layer is formed continuously asdescribed above, it need not be formed continuously so long as themechanical strength of the unit capacitance units can be securedthereby.

What is claimed:
 1. A method of manufacturing a semiconductor device,comprising: forming a capacitor unit on a semiconductor substrate,wherein said capacitor unit is divided into a plurality of capacitorsubunits including at least first and second capacitor subunits in sucha manner that said first and second capacitor subunits are divided by aseparating layer having a predetermined pattern, and each of saidcapacitor subunits comprises a first electrode layer, a second electrodelayer, and a dielectric layer interposed between said first electrodelayer and said second electrode layer, wherein said separating layer isformed between said first electrode layer of said first capacitorsubunit and said first electrode layer of said second capacitor subunit,and said separating layer is formed between said second electrode layerof said first capacitor subunit and said second electrode layer of saidsecond capacitor subunit.
 2. A method of manufacturing a semiconductordevice according to claim 1, wherein: said first electrode layer isformed by forming an impurity diffusion layer in a predetermined patternon said semiconductor substrate; said dielectric layer is formed on saidfirst electrode layer; and said second electrode layer is formed byforming a conductive silicon layer in a predetermined pattern on saiddielectric layer.
 3. A method of manufacturing a semiconductor deviceaccording to claim 2, wherein: said dielectric layer comprises a siliconoxide layer formed by a process also used to form the gate insulatinglayer of a MOS transistor; and said second electrode layer comprises aconductive silicon layer formed by a process also used to form the gateelectrode of the MOS transistor.
 4. A method of manufacturing asemiconductor device according to claim 2, wherein said separating layercomprises at least a silicon oxide layer formed by a process also usedto form an element separating region.
 5. A method of manufacturing asemiconductor device according to claim 2, wherein at least one shadinglayer is further formed above said second electrode layer.
 6. A methodof manufacturing a semiconductor device according to claim 5, whereinsaid shading layer comprises a metal layer formed by a process also usedto form a metal wiring layer.
 7. A method of manufacturing asemiconductor device according to claim 1, wherein: said first electrodelayer is formed by forming a metal layer in a predetermined patternabove said semiconductor substrate; said dielectric layer is formed onsaid first electrode layer; and said second electrode layer is formed byforming a metal layer in a predetermined pattern on said dielectriclayer.
 8. A method of manufacturing a semiconductor device according toclaim 7, wherein: said first electrode layer comprises a metal layerformed by a process also used to form a first metal wiring layer; andsaid second electrode layer comprises a metal layer formed by a processalso used to form a second metal wiring layer.
 9. A method ofmanufacturing a semiconductor device according to claim 7, wherein saidseparating layer for partitioning said capacitor subunits comprises atleast an interlayer insulating layer interposed between said firstelectrode layer and said second electrode layer.
 10. A method ofmanufacturing a semiconductor device according to claim 7, furthercomprising forming an interlayer insulating layer on the first electrodelayer and etching said interlayer dielectric layer to form an opening insaid interlayer dielectric layer extending to said first electrodelayer, wherein said dielectric layer is formed along the surface of theopening formed in said interlayer insulating layer on said firstelectrode layer, and said opening is formed such that the side thereofis made to a taper shape with the diameter thereof being graduallyincreased toward said second electrode layer.
 11. A method as in claim1, wherein said capacitor unit is also formed to include a firstconducting region connecting said first electrode layers of said firstand second capacitor subunits in parallel, and a second conductingregion connecting said second electrode layers of said first and secondcapacitor subunits in parallel.
 12. A method as in claim 1, wherein saidseparating layer comprises a plurality of layers formed between saidfirst and second capacitor subunits.
 13. A method of manufacturing asemiconductor device according to claim 1, further comprising forming aninterlayer insulating layer on the first electrode layer and etchingsaid interlayer insulating layer to form an opening in said interlayerinsulating layer extending to said first electrode layer, said openingbeing formed such that the side thereof is made to a taper shape with adiameter thereof being increased toward said second electrode layer, andwherein said dielectric layer is formed in said opening on said firstelectrode layer.
 14. A method of manufacturing a semiconductor deviceincluding a capacitor unit and additional circuit elements, comprising:forming said capacitor unit on a semiconductor substrate, wherein saidcapacitor unit is divided into a plurality of capacitor subunits whichare separated from each other by a separating layer, and each of saidcapacitor subunits comprises a first electrode layer, a second electrodelayer, and a dielectric layer interposed between said first electrodelayer and said second electrode layer; wherein said capacitor unit andsaid other circuit elements including at least a MOS transistor areformed using a common process.
 15. A method for manufacturing asemiconductor device comprising: forming a plurality of capacitorsubunits on a substrate, said subunits each comprising a first electrodelayer, a dielectric layer, and a second electrode layer; forming anseparating layer between adjacent subunits, said separating layercomprising an insulating layer disposed between adjacent secondelectrode layers; connecting at least a plurality of said subunitstogether in parallel; forming at least one MOS transistor on saidsubstrate, said MOS transistor including at least one layer formed atthe same time using the same deposition process as at least one layer ofsaid plurality of capacitor subunits; forming an interlayer insulatinglayer over said first electrode layer; and etching said interlayerinsulating layer to expose a portion of said first electrode layer, saidetching controlled to form sidewalls of said interlayer insulating layeron said first electrode layer adjacent to said exposed portion of saidfirst electrode layer, said sidewalls being inclined with respect to anupper surface of said first electrode layer at an angle in the range ofabout 30° to about 60°.
 16. A method as in claim 15, further comprisingforming said dielectric layer over said sidewalls and said exposedportion of said first electrode layer.
 17. A method as in claim 15,wherein said sidewalls are inclined with respect to an upper surface ofsaid first electrode layer at an angle in the range of 30° to 60°, andforming said dielectric layer on said exposed portion of said firstelectrode layer.
 18. A method as in claim 17, wherein said at least onelayer of said MOS transistor and said at least one layer of saidplurality of capacitor subunits are formed of an identical material. 19.A method of manufacturing a semiconductor device as in claim 17, whereinsaid separating layer is formed to include a plurality of layersdisposed between said first and second capacitor subunits.
 20. A methodfor manufacturing a semiconductor device as in claim 19, furthercomprising electrically connecting said first electrode layer of saidfirst and second capacitor subunits and electrically connecting saidsecond electrode layer of said first and second capacitor subunits. 21.A method for manufacturing a semiconductor device including a capacitorunit therein, comprising: forming first and second capacitor subunitseach comprising a first electrode layer, a second electrode layer, and adielectric layer therebetween; and forming a separating layer betweensaid first and second capacitor subunits, wherein said separating layeris formed between said first electrode layers of said first and secondcapacitor subunits, and between said second electrode layers of saidfirst and second capacitor subunits.
 22. A method of manufacturing asemiconductor device according to claim 21, further comprising forming aMOS transistor, wherein said dielectric layer comprises a silicon oxidelayer formed by a process also used to form a gate insulating layer ofsaid MOS transistor, and said second electrode layer comprises aconductive silicon layer formed by a process also used to form a gateelectrode of said MOS transistor.
 23. A method of manufacturing asemiconductor device according to claim 21, wherein said separatinglayer comprises at least a silicon oxide layer formed by a process alsoused to form an element separating region between said capacitor unitand an element adjacent to said capacitor unit.
 24. A method ofmanufacturing a semiconductor device according to claim 21, furthercomprising forming at least one shading layer above said secondelectrode layer, and wherein said shading layer comprises a metal layerformed by a process also used to form a metal wiring layer of a MOStransistor formed in the semiconductor device.
 25. A method ofmanufacturing a semiconductor device according to claim 21, furthercomprising forming a MOS transistor, wherein said first electrode layercomprises a metal layer formed during a process step also used to form afirst metal wiring layer of said MOS transistor, and wherein said secondelectrode layer comprises a metal layer formed during a process stepalso used to form a second metal wiring layer of said MOS transistor.26. A method of manufacturing a semiconductor device according to claim21, wherein said separating layer separating said capacitor subunitscomprises at least a portion of an interlayer insulating layerinterposed between said first electrode layer and said second electrodelayer.
 27. A method of manufacturing a semiconductor device according toclaim 21, further comprising forming said capacitor unit so that saidfirst electrode layers of said first and second capacitor subunits arein electrical contact and said second electrode layers of said first andsecond capacitor subunits are in electrical contact.
 28. A method ofmanufacturing a semiconductor device as in claim 21, wherein saidseparating layer comprises silicon oxide.
 29. A method for manufacturinga semiconductor device as in claim 21, further comprising: forming aninterlayer insulation layer on said first electrode layer; etching saidinterlayer insulation layer to expose at least a portion of said firstelectrode layer; forming said dielectric layer on said exposed portionof said first electrode; and forming said second electrode on saiddielectric layer.
 30. A method for manufacturing a semiconductor deviceas in claim 29, wherein said exposed portion of said first electrode isdefined by sidewalls of said interlayer insulation layer, and saidsidewalls are formed to be tapered outward from a bottom portion of saidsidewalls at said intersection of said sidewall and said first electrodeto a top portion of said sidewalls.
 31. A method of manufacturing asemiconductor device including a plurality of capacitor subunits,comprising: forming a first conductive layer over a substrate;patterning the first conductive layer in a predetermined pattern to forma plurality of first capacitor electrodes; forming an interlayerinsulating layer on the first conductive layer; forming openings in theinterlayer insulation layer over the plurality of first capacitorelectrode regions; forming a dielectric material in the openings overthe plurality of first capacitor electrode regions; and forming a secondconductive layer over the dielectric material and patterning the secondconductive layer to form a plurality of second capacitor electrodes;wherein said plurality of first capacitor electrodes are separated fromeach other by a separating region and said plurality of second capacitorelectrode are separated from each other by said separating region, saidseparating region comprising a portion of said interlayer insulationlayer.